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Helmut Liebl
Applied Charged Particle Optics

erschienen September 2007
132 Seiten, 100 illus., Gebunden
Springer-Verlag GmbH & Co. KG | ISBN: 3540719245
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VORWORT |  öffnen
PrefaceThis booklet is essentially an extended English version of a course I taught at the Max Planck Institute for Plasma Physics in Garching/ Munich for physicists and graduate students working at the Institute and for the nearby Physics Department of the Technical University. It covers mostly applications of particle optics which I have designed, built and worked with myself during my career, such as mass spectrometry, focusing of ion beams, emission microscopy, ion and electron beam systems,... [weiter lesen]
KLAPPENTEXT |  öffnen
Helmut Liebl Applied Charged Particle OpticsAuthored by a pioneer of the field, this overview of charged particle optics provides a solid introduction to the field for all physicists wishing to design their own apparatus or better understand the instruments with which they work. Applied Charged Particle Optics begins by introducing electrostatic lenses and lields used for acceleration, focussing and deflection of ions or electrons. Subsequent chapters give detailed descriptions of electrosta... [weiter lesen]
AUTOR |  öffnen
About the AuthorHelmut Liebl - born in 1927 in Bavaria - studied physics at the Technical University of Munich, and was awarded a diploma in 1953 and a doctorate in 1956. After three years as Wissenschaftlicher Assistent at the Technical University of Munich, he joined the Geophysics Corp. of America (GCA), Bedford, Mass., in 1959. In 1964 he became Senior Scientist at the Hasler Research Center of Applied Research Laboratories (ARL), Goleta, California. In 1968 he returned to Germany, where he ... [weiter lesen]
INHALTSVERZEICHNIS |  öffnen
Contents
1 Lenses: Basic Optics 1
1.1 Simple Transfer Matrices 4
1.2 Passage of Charged Particles Through a Uniform Electrostatic Field 7
1.3 Transfer Matrix of the Uniform Field 13
1.4 Acceleration of Charged Particles Emitted from a Planar Surface 14
1.5 Transfer Matrix of Electrostatic Field Between Spherical Concentric Equipotentia...
1.6 Acceleration of Charged Particles Emitted from a Spherical Surface 16
1.7 Passage of Charged Particles Through an Electrode with Round Aperture 18
1.8 General Aperture 21
1.9 Passage of Charged Particles Through an Electrode with Slotted Aperture 24
1.10 Emission Lenses 26
1.11 Immersion Lenses 34
1.12 Einzel Lenses 39
2 Electrostatic Deflection 45
2.1 Parallel Plate Condenser 45
2.2 Cylindrical Condenser 47
2.3 Spherical Condenser 55
2.4 Toroidal Condenser 59
3 Magnetic Deflection 67
3.1 Small Deflection Angles 67
3.2 Magnetic Sector Fields 69
3.3 Axial Focusing with Uniform Magnetic Sector Field 74
3.4 Non-Uniform Magnetic Sector Fields 78
4 Image Aberrations 89
4.1 Lenses 89
4.2 General Toroidal Condenser 91
4.3 Spherical Condenser 95
4.4 Cylindrical Condenser 96
4.5 Uniform Magnetic Sector Fields 98
4.6 Non-Uniform Magnetic Sector Fields 101
5 Fringe Field Confinement 105
A Applications 109
A. 1 Emission Lens Combined with Optical Mirror Objective Lens 109
A. 2 Combined Objective and Emission Lens 110
A. 3 Dynamic Emittance Matching 117
A. 4 Energy Analyzer for Parallel Beam with Coinciding Entrance and Exit Axes 117
A. 5 Elimination of Transverse Image Aberrations of Sector Fields 123
A. 6 Energy-Focusing Mass Spectrometers 124
References 127
Index 129
[weiter lesen]  
 
REGISTER |  öffnen
Index
AAberration chromatic aberration, 89, 90, 124
- spherical aberration, 90
Aberration coefficient, 101
Acceleration, 9, 14-17, 21, 27, 34, 36, 47, 73, 117
Acceptance, 96, 101, 117
Aperture, 18, 19, 21, 24, 25, 29, 32, 33, 74, 95
Aperture lens, 22, 23, 27, 33
Axial focusing, 61, 64, 74
BBarber's construction, 70, 71, 123
CCoefficients aberration coefficients, 101
- matrix coefficients, 5, 7, 14, 16, 28, 35
Condenser cylindrical condenser, 47, 48, 50, 54, 55, 57, 64, 74, 96, 124
- parallel plate condenser, 45-47, 51
- spherical condenser, 55, 57, 59, 61, 95, 96
- toroidal condenser, 59, 60, 62, 65, 91
DDeceleration, 9, 14, 16, 35
Deflection electrostatic deflection, 47
- magnetic deflection, 68
Deflection angle, 46, 47, 67, 68, 121
Defocusing, 25, 29, 66
Dispersion, 46, 47, 50, 57, 62, 64, 68, 122
Diverging lens, 19, 21, 64, 75, 84, 122
Drift space, 5, 6, 14, 35
EEinzel lens, 6, 22, 33, 39, 41, 90, 116, 125
Electrostatic field, 11, 13, 14, 16, 68
Electrostatic sector field, 50, 69, 92, 98, 124
Emission lens, 26-28, 30-33, 109, 110
Emission microscopy, 30-32
Emittance, 117, 118
End face, 92, 94, 96, 105
Energy analyzer, 52, 53, 62, 94, 117, 122
Energy dispersion, 11, 12, 47, 51, 61, 70, 122, 123
Energy resolution, 51, 52, 57, 61, 122
Equipotential surface, 16, 18, 59, 91, 95, 98, 119
Ersatzfeldgrenze, 105
FField boundary, 51, 69, 74, 105
Field strength, 18, 21, 24, 29, 32, 47, 56, 78, 87, 92
Focal distance, 51, 57, 61, 70, 89
Focal length, 4, 19, 21, 22, 25, 32, 36, 40, 62
Focal plane, 35
Focal point, 2
Focus, 40, 55, 116, 118, 121, 125
Focusing axial focusing, 61, 64, 74
- radial focusing, 61, 75, 76, 82
Focusing lens, 64, 84
Fringe field, 46, 74-76, 103, 118
HHerzog shunt, 105, 119, 121
Hyperbolic functions, 64, 65
IImage aberration, 36, 97
Immersion lens, 22, 27, 29, 34, 36, 37
LLaplace equation, 33, 49, 56
Lens Zaperture lens, 22, 23, 27, 33
- converging lens, 21, 75
- diverging lens, 19, 21, 64, 75, 84, 122
- einzel lens, 6, 22, 33, 39, 41, 90, 116, 125
- emission lens, 26-28, 30-33, 109, 110
- immersion lens, 22, 27, 29, 34, 36
- objective lens, 109
MMagnetic deflection, 68
Magnetic field, 67, 73, 105, 124-126
Magnetic sector field, 69, 70, 74, 76, 78, 98, 101, 105, 123, 124
Magnification, 15, 20, 25, 32, 38, 51, 70
Mass spectrometer, 62, 84, 111, 117, 124, 126
Matrix, 2, 14, 22, 27, 32
Matrix coefficients, 5, 7, 14, 16, 28, 35
Mirror objective, 110
NNon-uniform magnetic field, 85-87
OObject, 3, 4, 30, 52, 57, 58, 61, 70, 82, 89, 90, 119, 121, 122, 125
Optic axis, 48, 49, 54-57, 59, 61, 69, 74, 78, 87, 92, 93, 122
PParallel plate condenser, 45-47, 51
Principal plane, 1, 32, 35, 50, 78, 120, 124, 125
Principal plane distance, 60, 64
RRadial focusing, 61, 75, 76, 82
Refraction, 9, 10, 22, 38, 89
SSector angle, 49, 52-54, 57, 61, 69, 73, 80, 103, 121, 122, 124
Sector field electrostatic sector field, 50, 69, 92, 98, 124
magnetic sector field, 69, 70, 74, 76, 78, 98, 101, 105, 123, 124
Slotted aperture, 24-26
Spherical surface, 16
Symmetric imaging, 53, 57, 58, 61, 73, 80, 95-97, 102
TTaylor series, 49, 56, 92
Telescopic imaging, 28-30, 36
Toroidal condenser, 59, 60, 62, 65, 91
Transfer matrix, 2, 4, 5, 7, 13, 16, 22, 32, 34, 50, 69, 116
UUniform electrostatic field, 7, 45
Uniform magnetic field, 67
VVirtual image, 3, 72
Virtual subject, 25
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